Παρόμοια τεκμήρια

• Growth kinetics and barrier properties of atmospheric pressure chemical vapor deposited silicon dioxide thin films : a thesis /
  ανά: Chapple - Sokol, Jonathan Daniel
  Έκδοση: (1988)
• Atmospheric pressure chemical vapor deposition of tin oxide films and the surface photovoltage measurements of amorphous silicon /
  ανά: Proscia, James William
  Έκδοση: (1988)
• Diamond chemical vapor deposition : : nucleation and early growth stages /
  ανά: Liu, Huimin
  Έκδοση: (1995)
• Handbook of chemical vapor deposition (CVD) : principles, technology and applications /
  ανά: Pierson, Hugh O.
  Έκδοση: (1992)
• The chemical elements and their compounds /
  ανά: Sidgwick, N. V.
  Έκδοση: (1950)