Chapple - Sokol, J. D. (1988). Growth kinetics and barrier properties of atmospheric pressure chemical vapor deposited silicon dioxide thin films: A thesis. Cambridge, MA.: Harvard University.
Παραπομπή Chicago StyleChapple - Sokol, Jonathan Daniel. Growth Kinetics and Barrier Properties of Atmospheric Pressure Chemical Vapor Deposited Silicon Dioxide Thin Films: A Thesis. Cambridge, MA.: Harvard University, 1988.
Παραπομπή MLAChapple - Sokol, Jonathan Daniel. Growth Kinetics and Barrier Properties of Atmospheric Pressure Chemical Vapor Deposited Silicon Dioxide Thin Films: A Thesis. Cambridge, MA.: Harvard University, 1988.
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